Effect of surface cleanness on the magnetic properties of CoNiCr and CoCrTa thin-film media fabricated using an ultraclean sputtering process

Journal of Magnetism and Magnetic Materials

Volumn 155, Issue 1-3, 1996, Pages 172-175

  Kawakita, S ^a   Sakurai, T ^a   Kikuchi, A ^a   Shimatsu, T ^a   Takahashi, M ^a  

^a NIPPON SHEET GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHROMIUM; COBALT ALLOYS; ETCHING; IMPURITIES; MAGNETIC ANISOTROPY; MAGNETIC PROPERTIES; OXYGEN; SPUTTER DEPOSITION; SUBSTRATES; SURFACE CLEANING; SURFACE PROPERTIES;

ADSORBED OXYGEN IMPURITIES; COBALT CHROMIUM TANTALUM; COBALT NICKEL CHROMIUM; GAS IMPURITIES; RE ADSORPTION; SLIGHT DRY ETCHING; SUBSTRATE SURFACE; SURFACE CLEANNESS; THIN FILM MEDIA; ULTRACLEAN SPUTTERING PROCESS;

MAGNETIC THIN FILMS;

EID: 0030562827     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-8853(95)00629-X     Document Type: Article

References (4)

1. M. Imakawa S. Ishibashi A. Hatashita T. Shimatsu M. Takahashi Proc. 14th ICMFS and E-MRS Joint Colloq. Germany 1994 247
2. T. Shimatsu M. Imakawa S. Ishibashi M. Takahashi Proc. 14th ICMFS and E-MRS Joint Colloq. Germany 1994 213
3. T. Shimatsu M. Takahashi Proc. IUMRS Int. Conf. on Electronic Materials (IUMRS-ICEM'94) Taiwan 1994 (to be published)
4. M. Imakawa, S. Ishibashi, M. Kuwabara, T. Shimatsu and M. Takahashi, J. Magn. Magn. Mater., to be published.