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Applied Surface Science

Volumn 92, Issue , 1996, Pages 491-495

Oxygen etching of the Si(100)-(2 × 1) surface

(3) Wei, Y a Hong, Y a Tsong, I S T a

a ARIZONA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ETCHING; OXYGEN; PRESSURE; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SPUTTERING; TEMPERATURE;

DIMER VACANCIES; NARROW LINE VACANCIES; STEP ETCHING;

SURFACES;

EID: 0030562436 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00283-9 Document Type: Article

Times cited : (13)

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