Ellipsometric study of thermal and laser annealed amorphous and microcrystalline silicon films

Applied Surface Science

Volumn 92, Issue , 1996, Pages 300-305

  Jayatissa, Ahalapitiya Hewage ^a   Suzuki, Michio ^b   Nakanishi, Yoichiro ^a   Hatanaka, Yoshinori ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b 4 15 3 Hidashi Koigakubo Kokubunji   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COMPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; DIELECTRIC PROPERTIES; ELLIPSOMETRY; FUNCTIONS; LASER APPLICATIONS; MATHEMATICAL MODELS; RECRYSTALLIZATION (METALLURGY); SPECTROSCOPY;

CRYSTALLINITY FACTOR; ENERGY DENSITY; MICROCRYSTALLINE FILMS; RADIO FREQUENCY GLOW DISCHARGE METHOD; SPECTROSCOPIC ELLIPSOMETRY;

SILICON;

EID: 0030562426     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00246-4     Document Type: Article

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