Glow discharge sputtering deposition of thin films of Ag, Cr, Cu, Ni, Pd, Rh and their binary alloys onto NaCl and MgO experimental parameters and epitaxy

Applied Surface Science

Volumn 92, Issue , 1996, Pages 35-42

  Reniers, F ^a   Delplancke, M P ^a   Asskali, A ^a   Rooryck, V ^a   Van Sinay, O ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINARY ALLOYS; COMPOSITION EFFECTS; EPITAXIAL GROWTH; GLOW DISCHARGES; MAGNESIA; METALLIC FILMS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SODIUM CHLORIDE; SPUTTER DEPOSITION; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

GLOW DISCHARGE SPUTTERING DEPOSITION; INDUCTIVELY COUPLIED PLASMA; PARALLEL EPITAXY; SELECTED AREA DEPOSITION; TARGET COMPOSITION;

THIN FILMS;

EID: 0030562289     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00198-0     Document Type: Article

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