Coercivity of γ-(Fe 0.74 Mn 0.15 Co 0.11 ) 2 O 3 thin films by dc reactive magnetron sputtering

Applied Surface Science

Volumn 92, Issue , 1996, Pages 475-479

  Chang, Wei Der ^a   Chin, Tsung Shune ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COERCIVE FORCE; COPPER; DEPOSITION; INTERFACES (MATERIALS); MAGNETIC ANISOTROPY; MAGNETITE; MAGNETOSTRICTION; MAGNETRON SPUTTERING; MANGANESE; OXIDATION; STRESSES;

MAGHEMITE; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0030562178     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00280-4     Document Type: Article

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