Allowance for the contribution of diffuse scattering into integrated reflection intensities based on the analysis of diffraction-maximum profiles

Crystallography Reports

Volumn 41, Issue 3, 1996, Pages 404-412

  Stash, A I ^a   Zavodnik, V E ^a  

^a KARPOV INSTITUTE OF PHYSICAL CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030556870     PISSN: 10637745     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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