X-ray photoelectron study of the reactive ion etching of SixGe1-x alloys in SF6 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 1, 1996, Pages 156-164

  Peignon, M C ^a   Cardinaud, Ch ^a   Turban, G ^a   Charles, C ^b,c   Boswell, R W ^b  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c LPCM   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030555160     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579913     Document Type: Article

References (34)

1. G. L. Patton et al., IEEE Trans. Electron Device Lett. 11, 171 (1990).
2. S. Galdin, P. Dolfus, and P. Hesto, J. Appl. Phys. 75, 2963 (1994).
3. H. Temkin, T. P. Pearsall, J. C. Bean, R. A. Logan, and S. Luryi, Appl. Phys. Lett. 48, 963 (1986).
4. K. L. Wang and R. P. G. Karunasiri, J. Vac. Sci. Technol. B 11, 1159 (1993).
5. Z. Xu, X. Zou, X. Zhou, B. Zhao, C. Wang, and Y. Hamakawa, J. Appl. Phys. 75, 588 (1994).
6. J. G. Couillard and H. G. Craighead, J. Vac. Sci. Technol. B 11, 717 (1993).
7. A. A. Bright, S. S. Iyer, S. W. Robey, and S. L. Delage, Appl. Phys. Lett. 53, 2328 (1988).
8. G. S. Oehrlein, Y. Zhang, G. M. W. Kroesen, E. de Frésart, and T. D. Bestwick, Appl. Phys. Lett. 58, 2252 (1991).
9. G. S. Oehrlein, T. D. Bestwick, P. L. Jones, and J. W. Corbett, Appl. Phys. Lett. 56, 1436 (1990).
10. G. S. Oehrlein, T. D. Bestwick, P. L. Jones, M. A. Jaso, and J. L. Lindström, J. Electrochem. Soc. 138, 1443 (1991).
11. R. Cheung, T. Zijlstra, E. van der Drift, L. J. Geerligs, A. H. Verbruggen, K. Werner, and S. Radelaar, J. Vac. Sci. Technol. B 11, 2224 (1993).
12. H. H. Richter, A. Wolff, B. Tillack, and T. Skaloud, Mater. Sci. Eng. B 27, 39 (1994).
13. G. Turban, B. Grolleau, P. Launay, and P. Briaud, Rev. Phys. Appl. 20, 609 (1985).
14. M. C. Peignon, Ch. Cardinaud, and G. Turban, J. Electrochem. Soc. 140, 505 (1993).
15. Ch. Cardinaud, M. C. Peignon, and G. Turban, in Proceedings of the 11th International Symposium on Plasma Chemistry 1993, Vol. 4, edited by J. Harry, p. 1505.
16. N. Sadeghi, H. Debontride, G. Turban, and M. C. Peignon, Plasma Chem. Plasma Process. 10, 553 (1990).
17. R. J. M. M. Snijkers, J. F. Coulon, and G. Turban, J. Phys. D 24, 1098 (1991).
18. G. S. Oehrlein, J. Vac. Sci. Technol. A 11, 34 (1993).
19. Y. Zhang, G. S. Oehrlein, and E. de Frésart, J. Appl. Phys. 71, 1936 (1992).
20. A. Campo, Ch. Cardinaud, and G. Turban, J. Vac. Sci. Technol. B 13, 235 (1995).
21. A. Campo, Ch. Cardinaud, and G. Turban, Plasma Sources Sci. Technol. 4, 398 (1995).
22. Handbook of Chemistry and Physics, 71th ed., edited by R. C. Weast (Chemical Rubber, Boca Raton, FL, 1991).
23. C. D. Wagner, Practical Surface Analysis by Auger and XPS, edited by E. Briggs and M. P. Seah (Wiley, New York, 1983).
24. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 17, 911 (1991); 17, 927 (1991).
25. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 17, 911 (1991); 17, 927 (1991).
26. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, MN, 1992).
27. J. Royer, G. Turban, and B. Grolleau, Nucl. Instrum. Methods B 72, 369 (1992).
28. M. C. Peignon, Ch. Cardinaud, and G. Turban, J. Appl. Phys. 70, 3314 (1991).
29. F. R. McFeely, J. F. Morar, N. D. Shinn, G. Landgren, and F. J. Himpsel, Phys. Rev. B 30, 764 (1984).
30. G. S. Oehrlein, S. W. Robey, and J. L. Lindström, Appl. Phys. Lett. 52, 1170 (1988).
31. S. W. Robey, A. A. Bright, G. S. Oehrlein, S. S. Iyer, and S. L. Delage, J. Vac. Sci. Technol. B 6, 1650 (1988).
32. G. S. Oehrlein, G. M. W. Kroesen, E. de Frésart, Y. Zhang, and T. D. Bestwick, J. Vac. Sci. Technol. A 9, 768 (1991).
33. Y. Zhang, G. S. Oehrlein, and E. de Frésart, J. Vac. Sci. Technol. A 11, 2492 (1993).
34. P. Briaud, G. Turban, and B. Grolleau, Mater. Res. Soc. Symp. Proc. 68, 109 (1986).