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Volumn 41, Issue 1, 1996, Pages 134-141

The role of intrinsic point defects in the formation of oxygen precipitation centers in dislocation-free silicon

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0030548190     PISSN: 10637745     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (17)
  • 13
    • 0002008981 scopus 로고
    • Huff, R., Abe, T., Kolbesen, B.O., Eds., New York: Electrochem. Soc.
    • Harada, H., Abe, T., and Chikawa, J., Semiconductor Silicon, Huff, R., Abe, T., Kolbesen, B.O., Eds., New York: Electrochem. Soc., 1986, p. 76.
    • (1986) Semiconductor Silicon , pp. 76
    • Harada, H.1    Abe, T.2    Chikawa, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.