Cold-wall ultrahigh vacuum chemical vapor deposition of doped and undoped Si and Si1-xGex epitaxial films using SiH4 and Si2H6

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 1, 1996, Pages 170-183

  Li, C ^a   John, S ^a   Quinones, E ^a   Banerjee, S ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030540775     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579915     Document Type: Article

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