Simulation of microloading in aluminum etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 398-403

  Aoki, Masahiko ^a   Sasamura, Yoshitaka ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030530809     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580096     Document Type: Article

References (12)

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