Determination of trace impurities on silicon-wafer surface by isotope dilution analysis using electrothermal vaporization/inductively coupled plasma mass spectrometry

Analytical Sciences

Volumn 12, Issue 1, 1996, Pages 21-25

  Komoda, Mitsunori ^a   Chiba, Koichi ^a,c   Uchida, Hiroshi ^b  

^a NIPPON STEEL CORPORATION   (Japan)

^b Kanagawa Indust Research Institute   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

Copper; Electrothermal vaporization; Inductively coupled plasma mass spectrometry; Isotope dilution analysis; Lead; Silicon wafer; Zinc

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC ABSORPTION SPECTROMETRY; COPPER; ELECTRIC HEATING; ETCHING; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; LEAD; MASS SPECTROMETERS; NITRIC ACID; RADIOISOTOPES; TRACE ANALYSIS; VAPORIZATION; ZINC;

CALIBRATION METHOD; ELECTROTHERMAL VAPORIZATION; ELEMENT DETERMINATION; GRAPHITE FURNACE ATOMIC ABSORPTION SPECTROMETRY; ISOTOPE DILUTION ANALYSIS; ISOTOPE-RATIO MEASUREMENTS; RELATIVE STANDARD DEVIATIONS; SILICON WAFER SURFACE;

SILICON WAFERS;

EID: 0030528854     PISSN: 09106340     EISSN: None     Source Type: Journal    
DOI: 10.2116/analsci.12.21     Document Type: Article

References (26)

1. M. Hourai, K. Murakami, T. Shigematsu, N. Fujino and T. Shiraiwa, Jpn. J. Appl. Phys., 28, 2413 (1989).
2. S. Kato and Y. Maruo, J. Electrochem. Soc., 139, 1756 (1992).
3. M. Takiyama, S. Ohtsuka, S. Hayashi and M. Tachimori, Clean Tequnology, 5, 345 (1993).
4. D. Beauchemin, J. W. McLaren, A. P. Mykytiuk and S. S. Berman, Anal. Chem., 59, 778 (1987).
5. T. Kato, S. Nakamura and M. Monta, Anal. Sci., 6, 623 (1990).
6. K. Akatsuka, J. W. McLaren, J. W. Lam and S. S. Berman, J. Anal. At. Spectrom., 7, 889 (1992).
7. G. E. M. Hall, C. J. Park and J. C. Pelchat, J. Anal. At. Spectrom., 2, 189 (1987).
8. C. Pin, S. Lacombe, P. Telouk and J. Imbert, Anal. Chim. Acta, 256, 153 (1992).
9. A. Stroh, At. Spectrosc., 14, 141 (1993).
10. M. J. Campbell, G. Vermeir and R. Dams, J. Anal. At. Spectrom., 7, 617 (1992).
11. Y. Igarashi and K. Shiraishi, Anal. Sci., 8, 475 (1992).
12. A. Makishima, I. Inamoto and K. Chiba, Appl. Spectrosc., 44, 91 (1990).
13. H. Umeda, I. Inamoto and K. Chiba, Bunseki Kagaku, 39, 283 (1990).
14. H. Umeda, I. Inamoto and K. Chiba, Bunseki Kagaku, 40, 109 (1991).
15. K. Chiba, I. Inamoto and M. Saeki, J. Anal. At. Spectrom., 7, 115 (1992).
16. I. Inamoto and K. Chiba, Tetsu-to-Hagane, 79, 175 (1993).
17. C. J. Park, S. R. Prk, S. R. Yang, M. S. Han and K. W. Lee, J. Anal. At. Spectrom., 7, 641 (1992).
18. S. A. Darke, C. J. Pickford and J. F. Tyson, Anal. Proc., 26, 379 (1989).
19. C. J. Park, J. C. Van Loon, P. Arrowsmith and J. B. French, Anal. Chem., 59, 2191 (1987).
20. N. Shibata, N. Fudagawa and M. Kubota, Anal. Chem., 63, 636 (1991).
21. H. Matusiewicz, F. L. Fricke and R. M. Barnes, Anal. Chim. Acta, 1, 203 (1986).
22. C. J. Park and G. E. M. Hall, J. Anal. At. Spectrom., 2, 473 (1987).
23. C. J. Park and G. E. M. Hall, J. Anal. At. Spectrom., 3, 355 (1988).
24. R. J. Bowins and R. H. McNutt, J. Anal. At. Spectrom., 9, 1233 (1994).
25. K. Kubota, Abstracts of Papers, the 54 th Symposium on Analytical Chemistry, Mito, 1993, p. 87.
26. W. Kern and D. A. Puotien, RCA Rev., 31, 187 (1970).