Solid-state reaction of Ti and Ni thin films with aluminum nitride

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2564-2569

  He, Xiangjun ^a   Tao, Kun ^a   Fan, Yudian ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030520581     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579982     Document Type: Article

References (9)

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