Removal of organic impurities from the silicon surface by oxygen and uv cleaning

Korean Journal of Chemical Engineering

Volumn 13, Issue 3, 1996, Pages 328-330

  Kim, Chang Koo ^a   Chung, Chan Hwa ^b   Moon, Sang Heup ^a  

^a Seoul National University   (South Korea)

^b University of California   (United States)

Author keywords

Atomic Oxygen; Hydroxyl Radical; Ozone; Porous Silicon; UV Cleaning

Indexed keywords

EID: 0030517397     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02705958     Document Type: Article

References (12)

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