Effect of Hydrogen Addition to the Discharge Gas in Radio-Frequency Argon Glow-Discharge Mass Spectrometry for Nonconducting Samples

Analytical Sciences

Volumn 12, Issue 4, 1996, Pages 591-595

  Tanaka, Tomokazu ^a   Matsuno, Motoya ^a   Woo, Jin Chun ^b   Kawaguchi, Hiroshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Glow discharge mass spectrometry; Mixed gas; Nonconducting sample; Radio frequency; Sputtering rate

Indexed keywords

ARGON; GLOW DISCHARGES; HYDROGEN; MASS SPECTROMETRY; RADIO WAVES; SILICON CARBIDE; SINTERED CARBIDES; SINTERING; SPUTTERING; ZIRCONIA;

ARGON GLOW DISCHARGES; CONCENTRATION RANGES; EFFECT OF HYDROGEN; GLOW DISCHARGE MASS SPECTROMETRY; MIXED GAS; RADIO FREQUENCIES; SILICON CARBIDES (SIC); SPUTTERING RATE;

IONS;

EID: 0030507008     PISSN: 09106340     EISSN: None     Source Type: Journal    
DOI: 10.2116/analsci.12.591     Document Type: Article

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