Oscillatory behavior in electrochemical deposition reaction of polycrystalline silicon thin films through reduction of silicon tetrachloride in a molten salt electrolyte

Chemistry Letters

Volumn , Issue 7, 1996, Pages 569-570

  Matsuda, Toshihiko ^a   Nakamura, Shinsuke ^a   Ide, Ken Ichiro ^a   Nyudo, Kazuiku ^a   Yae, Shinji ^a   Nakato, Yoshihiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030493798     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.1996.569     Document Type: Article

References (12)

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