Thermal study of a silylmethylated fullerene leading to preparation of its vacuum deposited thin films

Chemistry Letters

Volumn , Issue 7, 1996, Pages 519-520

  Nagashima, Hideo ^a   Kato, Yoshiyuki ^a   Satoh, Hirohisa ^a   Kamegashima, Naoki ^a   Itoh, Kenji ^a,c   Kazuhiro, Oi ^b   Saito, Yahachi ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b MIE UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030493796     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.1996.519     Document Type: Article

References (21)

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