Comparison of submicron particle analysis by Auger electron spectroscopy, time-of-flight secondary ion mass spectrometry, and secondary electron microscopy with energy dispersive x-ray spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2392-2404

  Childs, Kenton D ^a   Narum, David ^a   LaVanier, Lori A ^a   Lindley, Patricia M ^b   Schueler, Bruno W ^a   Mulholland, George ^c   Diebold, Alain C ^d  

^a Physical Electronics Inc Minnesota   (United States)

^b CHARLES EVANS AND ASSOCIATES   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030493031     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580027     Document Type: Review

References (9)

1. A. Dicbold, A Comparison of Particle Composition Analysis Methods, Sematech Technology Transfer Document No. 95042788A-TR (Sematech, Austin, TX, 1995).
2. National Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 1994).
3. A. Diehold, Metrology Roadmap: A Supplement to the National Technology Roadmap for Semiconductors, Sematech Technology Transfer Document No. 94102578A-TR (Sematech, Austin, TX, 1995).
4. Electron Flight Simulator™ Version 2.0, Small World, P.O. Box 25284, San Mateo, CA 94402.
5. M. M. El Gomati, A. P. Janssen, M. Prutton, and J. A. Venables, Surf. Sci. 85, 309 (1979).
6. M. M. El Gomati and M. Prutton, Surf. Sci. 72, 485 (1978).
7. N. M. Glezos and A. G. Nassiopoulos, Surf. Sci. 254, 309 (1991).
8. R. R. Olson, L. A. LaVanier, and D. H. Narum, Appl. Surf. Sci. 70/71, 266 (1993).
9. K. D. Childs, L. A. LaVanier, and K. P. Muller, in Proceedings of the Third International Conference on Materials and Process Characterization for VLSI. 1994, edited by X. F. Zong, M. K. Balazs, and J. J. Wang (Asia-Pacific Microanalysis Association, Shanghai, China, 1994), pp. 16-22.