Molecular beam sampling to analyze the reaction mechanism of chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2337-2342

  Tsutsumi, Y ^a   Ikegawa, M ^a   Usui, T ^a   Ichikawa, Y ^a   Watanabe, K ^a   Kobayashi, J ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030491612     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580019     Document Type: Article

References (13)

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