Ultrahigh vacuum scanning tunneling microscope-based nanolithography and selective chemistry on silicon surfaces

Israel Journal of Chemistry

Volumn 36, Issue 1, 1996, Pages 3-10

  Lyding, J W ^a   Shen, T C ^a   Abeln, G C ^a   Wang, C ^a   Scott, P A ^a   Tucker, J R ^a   Avouris, Ph ^b   Walkup, R E ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030490790     PISSN: 00212148     EISSN: None     Source Type: Journal    
DOI: 10.1002/ijch.199600003     Document Type: Article

References (20)

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