Physical properties and chemical states of rf sputter deposited SiWOx films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2243-2246

  Shibata, Itaru ^a   Nishide, Toshikazu ^a   Hasegawa, Toshinori ^b  

^a NISSAN MOTOR CO   (Japan)

^b NISSAN ARC LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030490125     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580054     Document Type: Article

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