Plasma assisted chemical vapor deposition of aluminum for metallization in ULSI

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 283-288

  Kim, Dong Chan ^a   Kim, Young Soung ^a   Joo, Seung Ki ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMINES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; METALLIC FILMS; PLASMA APPLICATIONS; SILICA; SILICON; TITANIUM NITRIDE; ULSI CIRCUITS;

PLANARIZED METALLIZATION; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD);

THIN FILMS;

EID: 0030422091     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-427-283     Document Type: Conference Paper

References (8)