Film crystallographic texture and substrate surface roughness in layered aluminum metallization

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 261-271

  Rodbell, K P ^a   Svilan, V ^a   Gignac, L M ^a   Dehaven, P W ^a   Murphy, R J ^a   Licata, T J ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; CRYSTAL ORIENTATION; METALLIZING; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICA; SURFACE ROUGHNESS; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

GLANCING INCIDENCE X RAY REFLECTIVITY (GIXR); PHYSICAL VAPOR DEPOSITION (PVD);

SEMICONDUCTING FILMS;

EID: 0030420875     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)