Novel method for studying degradation related to plasma processing of silicon wafers

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 437-442

  Lagowski, J ^a   Hoff, A ^a   Jastrzebski, L ^a   Edelman, P ^a   Esry, T ^a  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; DEGRADATION; HEAVY METALS; PLASMA DIAGNOSTICS; RADIATION DAMAGE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING; SURFACE PROPERTIES; ULTRAVIOLET RADIATION; VOLTAGE MEASUREMENT;

SURFACE PHOTOVOLTAGE (SPV) MEASUREMENT;

SILICON WAFERS;

EID: 0030420870     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)