Oxidation resistance of copper alloy thin films formed by chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 25-30

  Atanasova, P ^a   Bhaskaran, V ^a   Kodas, T ^a   Hampden Smith, M ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER ALLOYS; ELECTRIC CONDUCTIVITY; FILM PREPARATION; MORPHOLOGY; OXIDATION RESISTANCE; PALLADIUM ALLOYS; THIN FILMS;

COOPER PALLADIUM ALLOY FILMS;

SEMICONDUCTING FILMS;

EID: 0030420059     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-25     Document Type: Conference Paper

References (19)