Precise stress control of Ta absorber using low stress alumina etching mask for x-ray mask fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 35, Issue 12 B, 1996, Pages 6347-6695

  Iba, Yoshihisa ^a   Kumasaka, Fumiaki ^a   Aoyama, Hajime ^a   Taguchi, Takao ^a   Yamabe, Masaki ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; ETCHING; STRESSES; TANTALUM; TEMPERATURE; THIN FILMS; X RAY LITHOGRAPHY;

ABSORBER; ETCHING MASK; X RAY MASK;

MASKS;

EID: 0030419705     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review

References (21)