Characterization of the early stages of EM in Al-based metal lines by means of a HRRMT based on an extremely stable ambient temperature

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 133-139

  D'Haeger, V ^a   De Ceuninck, W ^a   De Schepper, L ^a   Stals, L M ^a  

^a HASSELT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; SEMICONDUCTING FILMS; THERMAL EFFECTS;

HIGH RESOLUTION RESISTOMETRIC MEASUREMENT TECHNIQUE (HRRMT); LOW CURRENT STRESSES; TESTED METAL LINES;

ELECTROMIGRATION;

EID: 0030417852     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-133     Document Type: Conference Paper

References (12)