메뉴 건너뛰기




Volumn 158, Issue 2, 1996, Pages 385-396

Surface morphology and structural modifications of Si targets submitted to intense pulsed-laser irradiations

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; IRRADIATION; LASER BEAM EFFECTS; LASER PULSES; MORPHOLOGY; RAMAN SCATTERING; SURFACES; TARGETS;

EID: 0030417558     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211580206     Document Type: Article
Times cited : (8)

References (20)
  • 14
    • 77957079945 scopus 로고
    • Melting Model of Pulsed Laser Processing
    • Ed. R. F. WOOD, C. W. WHITE, and R. T. YOUNG, Academic Press, New York
    • R. F. WOOD and J. E. JELLISON, JR., Melting Model of Pulsed Laser Processing, in: Semiconductors and Seminietals, Ed. R. F. WOOD, C. W. WHITE, and R. T. YOUNG, Vol. 23, Academic Press, New York 1984 (p. 165).
    • (1984) Semiconductors and Seminietals , vol.23 , pp. 165
    • Wood, R.F.1    Jellison Jr., J.E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.