Recent developments in electrical linewidth and overlay metrology for integrated circuit fabrication processes

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 35, Issue 12 B, 1996, Pages 6347-6695

  Cresswell, Michael W ^a   Sniegowski, Jeffry J ^a   Ghoshtagore, Rathindra N ^a   Allen, Richard A ^a   Guthrie, William F ^a   Gurnell, Andrew W ^a   Linholm, Loren W ^a   Dixson, Ronald G ^a   Teague, E Clayton ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; ELECTRIC VARIABLES MEASUREMENT; FABRICATION; SCANNING ELECTRON MICROSCOPY;

LINEWIDTH; OVERLAY; SEPARATION BY THE IMPLANTATION OF OXYGEN;

INTEGRATED CIRCUITS;

EID: 0030417550     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review

References (24)