Solid-phase crystallization of amorphous Si0.7Ge0.3/Si and Si/Si0.7Ge0.3 bilayer films on SiO2

Materials Research Society Symposium - Proceedings

Volumn 424, Issue , 1996, Pages 231-236

  Kim, Tae Hoon ^a   Ryu, Myung Kwan ^a   Kim, Jin Won ^a   Kim, Chang Soo ^a   Kim, Ki Bum ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; SILICA; SILICON WAFERS; X RAY CRYSTALLOGRAPHY;

BILAYER FILMS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SOLID PHASE CRYSTALLIZATION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030417029     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-424-231     Document Type: Conference Paper

References (9)