Pattern formation in solid film growth during CVD

Chemical Engineering Communications

Volumn 152-53, Issue , 1996, Pages 189-209

  Thiart, Jacob J ^a   Orlicki, Dariusz ^a   Hlavacek, Vladimir ^a  

^a the State University of New York   (United States)

Author keywords

CVD; Interface dynamics; Morphology; Pattern formation; Stability analysis

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; MORPHOLOGY; NUMERICAL METHODS; PHASE INTERFACES;

PATTERN FORMATION; SOLID FILMS;

FILM GROWTH;

EID: 0030416817     PISSN: 00986445     EISSN: None     Source Type: Journal    
DOI: 10.1080/00986449608936562     Document Type: Article

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