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Volumn , Issue , 1996, Pages 43-46
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Effects of channel quantization and temperature on off-state and on-state breakdown in composite channel and conventional InP-based HEMT's
a a a b b b b c,d e e c,d |
Author keywords
[No Author keywords available]
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Indexed keywords
GALLIUM ALLOYS;
GALLIUM ARSENIDE;
HIGH ELECTRON MOBILITY TRANSISTORS;
IMPACT IONIZATION;
INDIUM PHOSPHIDE;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR ALLOYS;
TEMPERATURE;
ELECTRIC BREAKDOWN;
ELECTRIC VARIABLES MEASUREMENT;
ELECTROLUMINESCENCE;
EMISSION SPECTROSCOPY;
IONIZATION;
SEMICONDUCTING GALLIUM COMPOUNDS;
TEMPERATURE MEASUREMENT;
CHANNEL QUANTIZATION;
CHANNEL TEMPERATURE;
COMPOSITE CHANNEL;
ELECTRICAL MEASUREMENT;
ELECTROLUMINESCENCE SPECTROSCOPY;
ELECTRON IMPACT-IONIZATION;
OFF STATE;
ON STATE;
ON-STATE BREAKDOWN;
TEMPERATURE COEFFICIENT;
III-V SEMICONDUCTORS;
HIGH ELECTRON MOBILITY TRANSISTORS;
CHANNEL QUANTIZATION;
IMPACT IONIZATION;
INDIUM GALLIUM ARSENIDE;
OFF STATE BREAKDOWN EFFECTS;
ON STATE BREAKDOWN EFFECTS;
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EID: 0030416758
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IEDM.1996.553118 Document Type: Conference Paper |
Times cited : (23)
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References (9)
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