Application of the Taguchi method in the optimization of laser micro-engraving of photomasks

International Journal of Materials and Product Technology

Volumn 11, Issue 3-4, 1996, Pages 333-344

  Chen, Y H ^a   Tam, S C ^a   Chen, W L ^a   Zheng, H Y ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Laser engraving; Parameter optimisation; Photomasks; Taguchi method

Indexed keywords

ETCHING; IRON OXIDES; LASER APPLICATIONS; LIQUID CRYSTAL DISPLAYS; MASKS; NEODYMIUM LASERS; OPTICAL GLASS; OPTIMIZATION; PARAMETER ESTIMATION; Q SWITCHED LASERS; STATISTICAL METHODS;

AVERAGE LASER POWER; BEAM EXPANSION RATIO; ENGRAVING SPEED; FOCAL LENGTH; LASER MICROENGRAVING; PHOTOMASKS; PULSE REPETITION RATE; TAGUCHI METHOD; YTTRIUM ALUMINUM GARNETS;

PHOTOLITHOGRAPHY;

EID: 0030416548     PISSN: 02681900     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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