Low temperature fabrication of thin film polycrystalline Si solar cell on the glass substrate and its application to the a-Si:H/polycrystalline Si tandem solar cell

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1996, Pages 661-664

  Yamamoto, Kenji ^a   Suzuki, Takayuki ^a   Yoshimi, Masashi ^a   Nakajima, Akihiko ^a  

^a KANEKA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; HYDROGEN; LOW TEMPERATURE PROPERTIES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING GLASS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR PLASMAS; SHORT CIRCUIT CURRENTS; SUBSTRATES; THIN FILMS;

LASER CRYSTALLIZATION; PLASMA CHEMICAL VAPOR DEPOSITION; REFLECTANCE MEASUREMENT; SHORT CIRCUIT CURRENT DENSITY;

SILICON SOLAR CELLS;

EID: 0030415867     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pvsc.1996.564215     Document Type: Conference Paper

References (11)