Chemical vapour deposition of diamond at low substrate temperatures using fluorinated precursors

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 196-199

  Hentschel, F ^a   Schmidt, I ^a   Benndorf, C ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Chemical vapour deposition; Diamond; Fluorinated hydrocarbons; Mass spectrometry

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; COMPUTER SIMULATION; FILM GROWTH; FLUORINE COMPOUNDS; HYDROCARBONS; INTERFEROMETRY; MASS SPECTROMETRY; RAMAN SPECTROSCOPY;

FLUORINATED HYDROCARBONS; LASER INTERFEROMETRY; SOFTWARE PACKAGE CHEMKIN;

DIAMOND FILMS;

EID: 0030415585     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09128-6     Document Type: Article

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