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Volumn 420, Issue , 1996, Pages 277-281
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Highly conductive P-type microcrystalline silicon thin films
a
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Author keywords
[No Author keywords available]
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Indexed keywords
BORON;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
FILM GROWTH;
OPTIMIZATION;
PLASMA APPLICATIONS;
SILICON;
THIN FILMS;
CRYSTALLINITY;
DOPING EFFICIENCY;
MICROCRYSTALLINE SILICON THIN FILMS;
PLASMA DEPOSITION;
CONDUCTIVE FILMS;
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EID: 0030413517
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-420-277 Document Type: Conference Paper |
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Times cited : (2)
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References (11)
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