Emissivity independent process control in a short wavelength arc lamp RTP chamber

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 321-326

  Lefrancois, Marcel E ^a   Camm, David M ^a   Hickson, Brendon J ^a  

^a Vortek Industries   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; CLOSED LOOP CONTROL SYSTEMS; ELECTRIC LAMPS; LIGHT EMISSION; PROCESS CONTROL; REFLECTION; TEMPERATURE DISTRIBUTION;

ARC LAMP; RAPID THERMAL PROCESSING CHAMBER; REFLECTIVITY MEASUREMENT; TIME TEMPERATURE PROFILE;

TEMPERATURE MEASUREMENT;

EID: 0030413340     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-321     Document Type: Conference Paper

References (4)