Uniform deposition of YBa2Cu3O7 thin films over an 8 inch diameter area by a 90° off-axis sputtering technique

Applied Physics Letters

Volumn 69, Issue 25, 1996, Pages 3911-3913

  Rao, R A ^a   Gan, Q ^a   Eom, C B ^a   Suzuki, Y ^b   McDaniel, A A ^c   Hsu, J W P ^c  

^a Duke University   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); MAGNETRON SPUTTERING; MORPHOLOGY; OXIDE SUPERCONDUCTORS; SILICON WAFERS; SPUTTER DEPOSITION; SUBSTRATES; SUPERCONDUCTING TRANSITION TEMPERATURE; SURFACE PHENOMENA; YTTRIUM COMPOUNDS;

OFF AXIS SPUTTERING; SURFACE PROFILOMETRY; UNIFORM DEPOSITION;

THIN FILMS;

EID: 0030413314     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117567     Document Type: Article

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