On the thickness-dependence of textures in electrodeposited copper-coatings

Materials Science Forum

Volumn 228-231, Issue PART 2, 1996, Pages 463-468

  Handreg, I ^a   Klimanek, P ^a   Lange, G ^a   Schneider, M ^b  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Atomic Force Microscopy; Cu Coatings; Electrodeposition; Epitaxy; Microstructure; Nucleation; Texture; X Ray Diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; CRYSTAL MICROSTRUCTURE; ELECTRODEPOSITION; ELECTROLYTES; EPITAXIAL GROWTH; IRON; NUCLEATION; OPTICAL MICROSCOPY; SHEET METAL; TEXTURES; X RAY DIFFRACTION ANALYSIS;

COPPER COATINGS; IRON SHEETS; THICKNESS DEPENDENCE; X RAY TEXTURE ANALYSIS;

COPPER;

EID: 0030412580     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.228-231.463     Document Type: Article

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