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Volumn 426, Issue , 1996, Pages 129-134
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Investigations of silicon nitride films for silicon solar cells
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPOSITION EFFECTS;
ELECTRIC CONDUCTIVITY MEASUREMENT;
INTERFACES (MATERIALS);
PASSIVATION;
PLASMA APPLICATIONS;
QUALITY CONTROL;
REFRACTIVE INDEX;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON NITRIDE;
SILICON SOLAR CELLS;
THIN FILMS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMA INDUCED DAMAGE;
TIME RESOLVED MICROWAVE CONDUCTIVITY MEASUREMENTS;
TRANSIENT SIGNAL;
SEMICONDUCTING FILMS;
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EID: 0030412308
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-426-129 Document Type: Conference Paper |
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Times cited : (2)
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References (15)
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