Stress distribution in Si under patterned thin film structures

Materials Research Society Symposium - Proceedings

Volumn 436, Issue , 1996, Pages

  Wong, S P ^a   Huang, L ^a   Guo, W S ^a   Cheung, W Y ^a   Zhao, Shounan ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; OXIDES; PHOTOELASTICITY; SEMICONDUCTOR DEVICE STRUCTURES; STRESS CONCENTRATION; THIN FILMS;

INFRARED PHOTOELASTICITY; PATTERNED THIN FILM STRUCTURES; THIN FILM STRUCTURES;

SEMICONDUCTING SILICON;

EID: 0030412236     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-436-239     Document Type: Conference Review

References (7)