Annealing of aluminum thin films deposited on silica

Physica A: Statistical Mechanics and its Applications

Volumn 233, Issue 3-4, 1996, Pages 640-654

  Fleury, Vincent ^a   Balazs, Lazlo ^a  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; FRACTALS; MORPHOLOGY; REACTION KINETICS; REDOX REACTIONS; SILICA; THERMAL EFFECTS; THERMODYNAMICS; THIN FILMS;

ALUMINUM THIN FILMS;

ALUMINUM;

EID: 0030411395     PISSN: 03784371     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0378-4371(96)00201-4     Document Type: Article

References (28)

1. Vigouroux, Ann. Chim. Phys. 12 (1897) 153.
2. A.E. Standage and M.S. Gani, J. Am. Ceram. Soc. 50 (1967) 101.
3. R. Silverman, J. Electrochem. Soc. 115 (1968) 674.
4. N.J. Chou and J.M. Eldridge, J. Electrochem Soc. 117 (1970) 1287.
5. K. Prabriputaloong and M.R. Piggott, J. Am. Ceram. Soc. 56 (1973) 184.
6. K. Prabriputaloong and M.R. Piggott, J. Am. Ceram. soc. 56 (1973) 177.
7. K. Prabriputaloong and M.R. Piggott, J. Electrochem. Soc. 121 (1974) 430.
8. G. Stanley and N. Ostrowsky, On Growth and Form, NATO ASI Series 100 and Random Fluctuations and Pattern Growth, NATO ASI Series 157.
9. T. Vicsek, Fractal Growth Phenomena (2nd Ed. World Scientific, Singapore 1992) and reference therein.
10. P. Meakin, in: Phase Transition and Critical Phenomena, Vol. 12 (Academic Press, New York, 1988) eds. Domb and Leibowitz and references therein.
11. E. Ben-Jacob and I. Cohen, this journal and references therein.
12. T.A. Witten and L.M. Sander, Phys. Rev. Lett. 47 (1981) 1400.
13. M.C. Bartelt and J.W. Evans, Phys. Rev. B 46 (1992) 12675.
14. L.H. Tang, J. Phys. Paris 123 (1993) 935.
15. G.S. Bales and D.C. Chrzan, Phys. Rev. B 50 (1994) 6057.
16. J.G. Amar, F. Family and P.M. Lam, Phys. Rev. B 50 (1994) 8781.
17. J.G. Amar and F. Family, Mater. Res. Soc. Symp. Proc. 367 (1995) 149.
18. P. Jensen, A.-L. Barabasi, H. Larralde, S. Havhn and H.E. Stanley, Phys. Rev. B 50 (1994) 15316.
19. F. Family, this conference, Pattern Formation, Fractals and Statistical Mechanics, Sydney, 4-5 January 1996.
20. L. Bardotti, P. Jensen, A. Hoareau, A. Treilleux and B. Cabaud, Phys. Rev. Lett. 74 (1995) 4694. In this experiment, the diffusion specie is composed of antimony clusters (of about a thousand atoms).
21. R.Q. Hwang, J. Schroder, C. Gunther and R.J. Behm, Phys. Rev. Lett. 67 (1991) 3279.
22. T. Michely, M. Hohage, M. Bott and G. Comsa, Phys. Rev. Lett. 70 (1993) 3943.
23. D.D. Chambliss and R.J. Wilson, J. Vac. Sci. Technol. B 9 (1991) 928.
24. G. Radnoczi, T. Vicsek, L.M. Sander and D. Grier, Phys. Rev. A 35 (1987) R4012. In this experiment, the diffusing species is not clearly identified, it is conjectured that Se is expelled from the crystal and diffuses away.
25. J. Zhang, D. Liu and K. Colbow, Phys. Rev. B 48 (1993) 9130.
26. W.T. Elam, S.A. Wolf, J. Sprague, D.U. Gubser, D. Van Vechten and G.L. Barz and P. Meakin, Phys. Rev. Lett. 54 (1985) 701.
27. J.M. Chabala, Phys. Rev. B. 46 (1992) 11 346. In this experiment, the diffusing species is Oxygen.
28. The ceramic used was Acticeram, purchased from Préciver (Maisons-Alfort, France). Acticeram is a slowly crystallized glass which can stand a temperature of 850°C without significant deformation. It is used in cooking appliances. The largest of all patterns (ca 1 mm) were obtained on this substrate, probably as a consequence of the slow crystallization, and of the reduced number of defects on the surface.