Microstructural characterization of Pt/Ti and RuO2 electrodes on SiO2/Si annealed in the oxygen ambient

Materials Research Society Symposium - Proceedings

Volumn 433, Issue , 1996, Pages 175-180

  Lee, Jeong Soo ^a   Kwon, Hyun Ja ^a   Jeong, Young Woo ^a   Kim, Hyun Ha ^a   Park, Kyu Ho ^a   Kim, Cha Yeon ^a  

^a LG Electronics Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ELECTRODES; INTERDIFFUSION (SOLIDS); MICROSTRUCTURE; OXIDATION; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HILLOCK FORMATION; THERMAL GROOVING PHENOMENON;

FERROELECTRIC MATERIALS;

EID: 0030410704     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-433-175     Document Type: Conference Paper

References (9)