Consideration on the producing of high aspect ratio micro parts using UV sensitive photopolymer

Proceedings of the International Symposium on Micro Machine and Human Science

Volumn , Issue , 1996, Pages 53-58

  Nakamoto, Takeshi ^a   Yamaguchi, Katsumi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPONENTS; IRRADIATION; MANUFACTURE; MATHEMATICAL MODELS; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PHOTOSENSITIVITY; POLYMERS; SOLIDIFICATION;

HIGH ASPECT RATIO; MASK BASED METHOD; PHOTOPOLYMER; ULTRAVIOLET LASER BEAM WRITING METHOD;

MICROELECTRONIC PROCESSING;

EID: 0030409334     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)