Microstructural analysis and modelling of thin porous silicon layers with variable angle spectroscopic ellipsometry

Materials Research Society Symposium - Proceedings

Volumn 431, Issue , 1996, Pages 259-264

  Pettersson, L A A ^a   Zangooie, S ^a   Bjorklund, R ^a   Arwin, H ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANODIC OXIDATION; CRYSTALLINE MATERIALS; ELLIPSOMETRY; FILM GROWTH; HYDROFLUORIC ACID; MATHEMATICAL MODELS; MULTILAYERS; POROSITY; SPECTROSCOPIC ANALYSIS; THIN FILMS;

CONSTANT CURRENT DENSITY; HYDROFLUORIC ACID ELECTROLYTE; THIN POROUS SILICON LAYERS; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

POROUS SILICON;

EID: 0030409249     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-431-259     Document Type: Conference Paper

References (20)