Thin metal and metal oxide films deposited by the anodic vacuum arc technique

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 279-284

  Markschlager P ^a   Lukhaub, W ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Anodic arc; Metal films; Metal oxide films

Indexed keywords

ADHESION; DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; IONIZATION; METALLIC FILMS; OXIDES; PLASMAS; VACUUM APPLICATIONS;

ANODIC ARC; ANODIC VACUUM ARC TECHNIQUE; METAL OXIDE FILMS;

THIN FILMS;

EID: 0030409204     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02991-X     Document Type: Article

References (5)

1. M. Mausbach, H. Ehrich and K.G. Müller, Mater. Sci. Eng., AL40 (1991) 825-829.
2. B. Hasse, Untersuchung des anodischen Vakuumbogens, Dissertation, Universität-GH Essen, 1992.
3. H. Ehrich, Vakuum-Technik, 37 (1988) 6.
4. Technische Daten über Aufdampf- und Zerstäubungsmaterialien, Katalog Balzers Vakuumtechnik, Wiesbaden.
5. P. Markschläger et al., Surf. Coat. Technol., 74/75 (1995) 849-856.