Pattern related non-uniformities during rapid thermal processing

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 327-333

  Bremensdorfer, R ^a   Marcus, S ^a   Nenyei, Z ^a  

^a STEAG AST Elektronik   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY TRANSFER; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; TEMPERATURE DISTRIBUTION; THERMOCOUPLES;

HEATER BANK CONTROL; INTERFERENCE EFFECTS; PASSIVE PATTERNS; PATTERN EFFECT; PATTERN INDUCED NONUNIFORMITIES; RAPID THERMAL PROCESSING;

ANNEALING;

EID: 0030409088     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-327     Document Type: Conference Paper

References (5)