Crystalline silicon films by chemical vapor deposition on glass for thin film solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1996, Pages 365-370

  Bergmann, R B ^a   Brendel, R ^a   Wolf, M ^a   Loelgen, P ^a   Werner, J H ^a   Krinke, J ^a   Strunk, H P ^a  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; GLASS; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE APPLICATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SUBSTRATES; TEXTURES; THIN FILM DEVICES; THIN FILMS;

CRYSTALLINE SILICON FILMS; HALL MOBILITY; MINORITY CARRIER DIFFUSION; SURFACE RECOMBINATION VELOCITY; THIN FILM SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 0030408737     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pvsc.1996.564021     Document Type: Conference Paper

References (21)