Application of porous silicon technology to optical waveguiding

IEE Colloquium (Digest)

Volumn , Issue 39, 1996, Pages

  Loni, A ^a   Bozeat, R J ^a   Krueger, M ^b   Berger, M G ^b   Arens Fischer, R ^b   Thoenissen, M ^b   Arrand, H F ^c   Benson, T M ^c  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTROLUMINESCENCE; OPTICAL WAVEGUIDES; POROUS SILICON; QUANTUM EFFICIENCY; QUANTUM ELECTRONICS; SILICON WAFERS; VLSI CIRCUITS;

FULL ISOLATION BY POROUS OXIDIZED SILICON (FIPOS);

INTEGRATED OPTOELECTRONICS;

EID: 0030408613     PISSN: 09633308     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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