Statistical metrology: understanding spatial variation in semiconductor manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2874, Issue , 1996, Pages 16-26

  Boning, Duane S ^a   Chung, James E ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

STATISTICAL METROLOGY;

DATA PROCESSING; DESIGN; INTEGRATED CIRCUIT LAYOUT; MICROELECTRONICS; OPTIMIZATION; PERFORMANCE; PROCESS CONTROL; RELIABILITY; STATISTICAL METHODS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030408017     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)