Tooling for wafer and photomask cleaning and surface preparation using a dry, laser-assisted technology

Proceedings of the IEEE/CPMT International Electronic Manufacturing Technology (IEMT) Symposium

Volumn , Issue , 1996, Pages 223-231

  Engelsberg, A C ^a   Lizotte, T E ^a   Ohar, O P ^a   O'Keefe, T R ^a  

^a Radiance Services Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CONTAMINATION; COST ACCOUNTING; INDUSTRIAL ECONOMICS; INERT GASES; LASER APPLICATIONS; MASKS; PHOTONS; QUANTUM THEORY; SUBSTRATES;

PHOTOMASK CLEANING; RADIANCE PROCESS; WAFER CLEANING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030407871     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)